Hydrogen fluoride (HF) is an important basic fluorochemical raw material, primarily serving as a source of fluorine in various chemical reactions. Due to its strong reactivity, hydrogen fluoride can undergo fluorination, complexation, and dissolution reactions with a variety of substances, thus playing a crucial role in the production of inorganic fluorides, organic fluorides, and fluorine-containing materials. It is an indispensable basic raw material in the modern fluorochemical industry chain.

Hydrogen fluoride is mainly used in the manufacture of fluoride salts, refrigerants, fluoropolymers, and other fluorine-containing chemicals. For example, HF provides a fluorine source in the production of products such as aluminum fluoride and cryolite; in the synthesis of organic fluorine compounds, it can be used to introduce fluorine, improving the heat resistance, chemical corrosion resistance, and stability of the products. Due to its wide range of applications, hydrogen fluoride is widely used in chemical, materials, and metallurgical fields.

High-purity hydrogen fluoride has special functions. Refined electronic-grade HF can be used for semiconductor wafer cleaning, oxide film removal, and wet etching processes, effectively removing oxide layers and some impurities from silicon wafer surfaces, improving the cleanliness of the material surface. With the continuous development of integrated circuit manufacturing technology, the requirements for the purity, moisture content and metal impurities of electronic-grade hydrogen fluoride are becoming increasingly stringent.