Ultra Pure Silane Gas
Ultra Pure Silane Gas

Ultra Pure Silane Gas

Ultra Pure Silane Gas (SiH₄) is a specialty gas designed for contamination-sensitive silicon deposition processes. Carefully controlled purity and trace impurity levels support semiconductor fabrication, advanced thin-film production, and other high-precision electronic materials applications.
Send Inquiry

Zibo Dijia Special Gas Co., Ltd. is one of the most reliable manufacturers and suppliers of ultra pure silane gas in China. If you're going to buy bulk ultra pure silane gas made in China, welcome to get quotation from our factory. All customized products are with high quality and competitive price.

 

 

Product Overview

 

Ultra Pure Silane Gas (SiH₄) is a high-purity silicon precursor used in advanced manufacturing processes that require stringent control of gas composition. Under appropriate process conditions, silane reacts or decomposes to form silicon-containing films, making it an important feed gas for chemical vapor deposition (CVD) and related technologies.

In semiconductor and electronic materials production, trace contaminants can affect film characteristics, electrical properties, and process reproducibility. Ultra-pure silane is therefore selected according to defined purity specifications and individual impurity limits, rather than nominal purity alone. Moisture and other process-relevant contaminants may require particularly close control depending on the application.

For buyers, specification matching is essential. The target purity, impurity profile, analytical methods, cylinder configuration, valve compatibility, and delivery requirements should be confirmed before an order is placed. A current technical data sheet and Certificate of Analysis (CoA) provide important information for evaluating whether a product meets the end user's process requirements.

5-2

 

99.9999% SiH4, Semiconductor Grade

 

Specification 99.9999%
Carbon Monoxide ≤ 0.05 ppm
Carbon Dioxide ≤ 0.05 ppm
Total chloride ≤ 0.1 ppm
Methane ≤ 0.05 ppm
C2-C4 ≤ 0.1 ppm
Nitrogen ≤ 0.5 ppm
Oxygen ≤ 0.05 ppm
Moisture ≤ 0.1 ppm
Silyl Ether ≤ 0.1 ppm
Methyl Silane ≤ 0.1 ppm
Disilane ≤ 0.3 ppm
Hydrogen ≤ 20 ppm
Aluminum ≤ 0.02 ppba
Antimony ≤ 0.02 ppba
Arsenic ≤ 0.02 ppba
Gallium ≤ 0.02 ppba
Boron ≤ 0.02 ppba
Phosphorus ≤ 0.02 ppba
Iron + Chromium + Nickel + Copper + Zinc ≤ 1 ppba

 

*Other Grades and Purity Available on Asking

 

Applications & Solutions

 

  • Semiconductor Manufacturing

Ultra Pure Silane Gas is used as a silicon precursor in selected semiconductor deposition processes. Tight impurity control helps reduce contamination risks in applications where film quality and device performance are sensitive to trace substances.

  • Advanced Thin-Film Deposition

Silane is used in CVD and related processes to produce silicon-containing layers. Gas quality, delivery consistency, and process compatibility are important for maintaining repeatable film composition and uniformity.

  • Photovoltaic Materials Production

Certain photovoltaic manufacturing processes use silane to produce silicon-based thin films. The required purity depends on the cell design, deposition technology, and acceptable contamination levels.

  • Electronic Materials Research

Advanced materials laboratories may use ultra-pure silane in controlled deposition experiments and silicon-material development. The product specification should reflect the experimental objectives, equipment design, and sensitivity to impurities.

 

product-700-700

Products Description

 

Cylinder Specifications Contents
Cylinder Capacity Valve Weight
47L DISS632 10 kgs
440L DISS632 120 kgs
 

*Other Packages Available on Asking

 

Why Choose Us

 

Choosing Ultra Pure Silane Gas means choosing stable quality, professional specialty gas experience, and application-focused service. We understand that advanced manufacturing customers require consistent performance and dependable cooperation, so we focus on reducing procurement risks and supporting long-term business grow.

 

3-3
 
5-1
 
Ultra Pure Silane Gas
 
 

 

FAQ

 

What is the chemical formula of silane gas?

Silane gas is a silicon-based specialty gas with the chemical formula SiH₄. It consists of one silicon atom and four hydrogen atoms, and is widely used as a silicon source material in advanced deposition processes.

What are the main applications of silane gas?

Silane gas is an essential process gas in semiconductor and electronic manufacturing industries. It is commonly used for silicon thin-film deposition, including applications such as amorphous silicon, polysilicon, silicon oxide, silicon nitride, and other silicon-based materials. It also plays an important role in photovoltaic production, microelectronics, and advanced semiconductor device fabrication.

What is the difference between silane gas and silane coupling agents?

Silane gas (SiH₄) is a high-purity inorganic specialty gas mainly used in semiconductor, photovoltaic, and thin-film manufacturing processes. Silane coupling agents are organic chemical additives typically used for improving bonding performance between inorganic materials and organic polymers. Although they share a similar name, their chemical structures and applications are completely different.

 

Hot Tags: ultra pure silane gas, China ultra pure silane gas manufacturers, suppliers, factory

Looking For A TrustworthySpecialty & Industrial Gas Supplier?

Partner with Dijiagases for one‑stop gas procurement backed by solid production resources. Access full product specifications, diverse cylinder packaging, MSDS documents, competitive factory‑direct pricing and customized gas supply solutions.

Send Inquiry