Carbon tetrafluoride (CF₄) is primarily used in semiconductor manufacturing, as it is one of the commonly used fluorine-containing gases in dry etching processes. Under plasma, CF₄ generates reactive fluorine-containing particles to remove specific substances from the surfaces of materials such as silicon and silicon dioxide, thereby forming the required micro-circuits and structures. As integrated circuit processing dimensions continue to shrink, higher requirements are placed on the purity, impurity content, and gas supply stability of CF₄.

The photovoltaic industry is also a significant application area for CF₄. In silicon wafer processing, CF₄ can be used in dry etching and equipment cleaning processes, removing residues and some film layers from the material surface through plasma reactions. Compared to traditional wet processing, related dry processes have certain advantages in precision machining and automated production; therefore, the use of high-purity process gases is widespread.

CF₄ also has applications in the production of display panels and electronic components. It is mainly used in thin-film etching and cavity cleaning processes, often in combination with other process gases to meet the requirements of different materials and processing stages. In practical applications, companies typically select appropriate gas purity and supply specifications based on equipment type, process conditions, and product requirements.

Besides the industries mentioned above, tetrafluoromethane (TEF) can also be used in some specialized industrial and scientific research fields. Due to its chemical stability, low boiling point, and excellent electrical insulation properties, it can play a role in certain processes that is difficult for other gases to replace. However, TEF is a fluorinated gas with high global warming potential, requiring careful attention to recovery, exhaust gas treatment, and emission control during production and use. For electronic products, future applications will increasingly emphasize gas purity, stable supply, and environmentally friendly treatment.